고반사 저손실 반사경 [High Reflectivity Low Loss Mirror] 외자구매

요약 AI 요약

이 사업은 이온 트랩 양자정보과학 실험에서 여러 파장의 레이저 빔을 정밀하게 전달하고 광경로를 구성하기 위한 고반사·저손실 반사경을 구매하는 것이다. 355nm, 369–399nm, 532nm, 740–760nm, 935nm 파장용 반사경을 확보하여 도플러 냉각, 상태 준비, 광펌핑, 형광 검출, 재펌핑, 라만 전이 등 정밀 레이저-이온 상호작용에 사용한다.

• 369–399 nm, 45° 저손실 반사경 120개
• 740–760 nm, 45° 저손실 반사경 50개
• 935 nm, 45° 저손실 반사경 50개
• 369–399 nm, 0° 저손실 반사경 50개
• 355 nm, 45° 저손실 반사경 50개
• 532 nm, 45° 저손실 반사경 50개

AI에게 이 공고를 물어볼 때 · ChatGPT · Claude에 이 링크를 함께 주면 공고문과 첨부를 정리한 글을 읽고 답합니다. /ai/projects/R26BK01737864 · 베타 기간 무료

사업 내용 · 이 공고에 든 일

중심 · 고반사 저손실 반사경 구매

물품 › 연구·실험·계측장비 › 기타 연구장비

UV 융합실리카 기판에 고반사 코팅한 레이저 광로용 반사경을 사는 연구용 광학부품 구매다.

• 제조자·공급자 증명서 등 납품 서류
• 90일 하자보증
• 2026.12.10 이전 선적

참가 자격 · 제한

업종제한

제한 없음

지역제한

제한 없음

공동수급

공동수급불허

입찰참가 제한

모름

실적경쟁 · PQ

모름

국제입찰

국제입찰

제출 방법

직찰

입찰 일정

가격

외화 예산

USD 32,300 (배정예산의 통화)

예정가격 방식

비예가

납품

품명

반사경 (4512169701)

수량

1 SET

인도조건

모름

제조물품

모름

세부품명 등록

모름

공고 정보

공고종류

등록공고 (일반공고)

게시일

09/20(일)

공고번호

R26BK01737864-000

참조번호

2026-B0022

공고기관

기초과학연구원

수요기관

기초과학연구원

계약방법

일반경쟁

낙찰방법

2단계경쟁입찰

계약유형

총액계약

예정가격 방식

비예가

추정가격

-

배정예산

-

사전규격번호

R26BD00271105

재공고

아니오

출처

나라장터

첨부파일

• HWP · 1. 2026-B022 외자구매 입찰공고문.hwp · 공고규격서
• DOCX · 1. 2026-B022 외자구매 입찰공고문_변환본.docx · 공고규격서
• DOCX · 2. 2026-B022 Notice of Bid.docx · 공고규격서
• HWP · 3. 2026-B022_Commodity_description(영문_구매규격서)_고반사_저손실_반사경.hwp · 공고규격서
• HWP · 4. 2026-B022 외자구매 입찰유의서 및 양식.hwp · 공고규격서
• DOCX · 5. 2026-B022 General Instructions to Bidders.docx · 공고규격서

첨부 내용을 정리한 글 — 자격 · 배점 · 일정 · 발췌 ›

문서 발췌

Ⅰ. 용도 및 특징(End-user's Use and Feature) This procurement consists of optical materials and research components, specifically high-reflectivity, low-loss mirror materials used to construct laser optical paths at various wavelengths and to precisely deliver laser beams in Yb⁺ and Ba⁺ trapped-ion quantum information science experiments. These optical materials support wavelengths of 355 nm, 369–399 nm, 532 nm, 740–760 nm, and 935 nm, and employ high-reflectivity coatings optimized for each wavelength to minimize optical loss during laser beam reflection and enable stable beam steering. Trapped-ion experiments require multiple laser optical paths for Doppler cooling, state preparation, optical pumping, fluorescence detection, repumping, Raman transitions, and other precise laser-ion interactions; therefore, optical materials with high reflectivity and excellent surface quality are essential. In particular, the UV fused silica substrates, high surface quality and flatness, low parallelism error, and high-reflectivity coatings minimize optical scattering and wavefront distortion while reducing cumulative optical power loss in complex optical systems employing multiple mirrors, thereby maintaining stable laser intensity and beam quality delivered to the ions. In addition, these mirror materials are designed for 0° and 45° angles of incidence, enabling precise configuration of laser beam propagation directions and optical paths according to experimental requirements. Therefore, these items are used as essential optical materials and research components for precise laser beam delivery, optical path construction, long-term stable optical alignment, and high experimental reproducibility in trapped-ion experiments.

Ⅱ. 장비의 구성(Configurations of Goods) 1. 369–399 nm, 45° Low Loss Mirror 120 EA 2. 740–760 nm, 45° Low Loss Mirror 50 EA 3. 935 nm, 45° Low Loss Mirror 50 EA 4. 369–399 nm, 0° Low Loss Mirror 50 EA 5. 355 nm, 45° Low Loss Mirror 50 EA 6. 532 nm, 45° Low Loss Mirror 50 EA Ⅲ. 성능 및 규격(Performance and Specification) A. Performance 1. 369–399 nm, 45° Low Loss Mirror 1）Shall use UV fused silica as the substrate material, providing suitable optical performance and stability for laser beam delivery in trapped-ion experiments. 2）Shall have a face diameter of Ø25.4 mm, ensuring compatibility with standard 1-inch optical mounts and experimental optical systems. 3）The face dimension tolerance shall be no greater than +0/-0.15 mm, ensuring dimensional accuracy and reliable installation in precision optical mounts. 4）The thickness shall be no greater than 6.35 mm, providing suitable dimensions for integration into the experimental optical setup. 5）The thickness tolerance shall be ±0.25 mm, ensuring consistent mechanical dimensions and stable optical alignment. 6）The clear aperture shall be greater than 85%, providing a sufficiently large usable optical area for efficient laser beam transmission and reflection. 7）The surface quality shall be 20/10 scratch-dig or better, minimizing surface defects and optical scattering during laser beam propagation. 8）The surface flatness shall be better than λ/6, minimizing wavefront distortion and maintaining high-quality laser beam propagation.

9）The parallelism error shall be less than 180 arcsec, ensuring sufficient parallelism between optical surfaces for stable beam alignment. 10）The coating shall provide HRs >99.95% and HRp >99.85% over the 369–399 nm wavelength range, ensuring high reflection efficiency for both s- and p-polarized laser beams. 11）Shall be designed for an angle of incidence (AOI) of 45°, enabling efficient beam steering and optical path construction for 369–399 nm lasers. 2. 740–760 nm, 45° Low Loss Mirror 1）Shall use UV fused silica as the substrate material, providing suitable optical performance and stability for 740–760 nm laser beam delivery. 2）Shall have a face diameter of Ø25.4 mm, ensuring compatibility with standard 1-inch optical mounts and experimental optical systems. 3）The face dimension tolerance shall be no greater than +0/-0.15 mm, ensuring dimensional accuracy and reliable installation in precision optical mounts. 4）The thickness shall be no greater than 6.35 mm, providing suitable dimensions for integration into the experimental optical setup. 5）The thickness tolerance shall be ±0.25 mm, ensuring consistent mechanical dimensions and stable optical alignment. 6）The clear aperture shall be greater than 85%, providing a sufficiently large usable optical area for efficient laser beam reflection. 7）The surface quality shall be 20/10 scratch-dig or better, minimizing optical scattering and degradation caused by surface imperfections.

8）The surface flatness shall be better than λ/6, maintaining laser wavefront quality and stable beam propagation. 9）The parallelism error shall be less than 180 arcsec, ensuring sufficient optical surface parallelism and stable beam alignment. 10）The coating shall provide HRs >99.95% and HRp >99.85% over the 740–760 nm wavelength range, minimizing optical power loss for both s- and p-polarized light. 11）Shall be designed for an angle of incidence (AOI) of 45°, supporting efficient beam steering and optical path configuration for 740–760 nm lasers. 3. 935 nm, 45° Low Loss Mirror 1）Shall use UV fused silica as the substrate material, providing suitable optical performance and mechanical stability for 935 nm laser applications. 2）Shall have a face diameter of Ø25.4 mm, ensuring compatibility with standard 1-inch optical mounts. 3）The face dimension tolerance shall be no greater than +0/-0.15 mm, ensuring accurate mechanical dimensions and reliable mounting. 4）The thickness shall be no greater than 6.35 mm, allowing convenient integration into precision optical systems. 5）The thickness tolerance shall be ±0.25 mm, ensuring consistent mechanical dimensions and stable positioning. 6）The clear aperture shall be greater than 85%, providing sufficient usable optical area for efficient laser beam reflection. 7）The surface quality shall be 20/10 scratch-dig or better, minimizing scattering and maintaining high optical quality.

8）The surface flatness shall be better than λ/6, reducing wavefront distortion and maintaining stable laser beam propagation. 9）The parallelism error shall be less than 180 arcsec, ensuring sufficient parallelism between the optical surfaces. 10）The coating shall provide HRs >99.95% and HRp >99.85% at 935 nm, ensuring high reflection efficiency and minimizing optical power loss. 11）Shall be designed for an angle of incidence (AOI) of 45°, enabling efficient steering of the 935 nm laser beam within the experimental optical system. 4. 369–399 nm, 0° Low Loss Mirror 1）Shall use UV fused silica as the substrate material, providing suitable optical performance and stability for ultraviolet laser applications. 2）Shall have a face diameter of Ø25.4 mm, ensuring compatibility with standard 1-inch optical mounts and optical systems. 3）The face dimension tolerance shall be no greater than +0/-0.15 mm, ensuring dimensional accuracy and reliable mechanical installation. 4）The thickness shall be no greater than 6.35 mm, providing suitable dimensions for integration into the experimental optical setup. 5）The thickness tolerance shall be ±0.25 mm, ensuring consistent dimensions and stable optical alignment. 6）The clear aperture shall be greater than 85%, providing sufficient usable optical area for efficient laser beam reflection. 7）The surface quality shall be 20/10 scratch-dig or better, minimizing surface-induced scattering and maintaining optical beam quality.

8）The surface flatness shall be better than λ/6, reducing wavefront distortion and maintaining stable laser propagation. 9）The parallelism error shall be less than 180 arcsec, ensuring sufficient parallelism between the optical surfaces for precise beam alignment. 10）The coating shall provide high reflectivity greater than 99.95% over the 369–399 nm wavelength range, minimizing optical power loss and supporting efficient laser beam control. 11）Shall be designed for normal incidence with an angle of incidence (AOI) of 0°, supporting optical configurations requiring direct normal-incidence reflection. 5. 355 nm, 45° Low Loss Mirror 1）Shall use UV fused silica as the substrate material, providing suitable optical performance and stability for 355 nm ultraviolet laser applications. 2）Shall have a face diameter of Ø25.4 mm, ensuring compatibility with standard 1-inch optical mounts and experimental optical systems. 3）The face dimension tolerance shall be no greater than +0/-0.15 mm, ensuring dimensional accuracy and reliable installation. 4）The thickness shall be no greater than 6.35 mm, providing suitable dimensions for integration into the optical setup. 5）The thickness tolerance shall be ±0.25 mm, ensuring consistent mechanical dimensions and stable positioning. 6）The clear aperture shall be greater than 85%, providing a sufficiently large usable optical area for efficient 355 nm laser beam reflection.

7）The surface quality shall be 20/10 scratch-dig or better, minimizing optical scattering and maintaining high-quality ultraviolet beam propagation. 8）The surface flatness shall be better than λ/6, minimizing wavefront distortion and preserving laser beam quality. 9）The parallelism error shall be less than 180 arcsec, ensuring sufficient optical surface parallelism and stable beam alignment. 10）The coating shall provide HRs >99.95% and HRp >99.85% at 355 nm, ensuring high reflection efficiency for both s- and p-polarized ultraviolet laser beams. 11）Shall be designed for an angle of incidence (AOI) of 45°, enabling efficient steering and routing of the 355 nm laser beam. 6. 532 nm, 45° Low Loss Mirror 1）Shall use UV fused silica as the substrate material, providing suitable optical performance and stability for 532 nm laser applications. 2）Shall have a face diameter of Ø25.4 mm, ensuring compatibility with standard 1-inch optical mounts and experimental optical systems. 3）The face dimension tolerance shall be no greater than +0/-0.15 mm, ensuring dimensional accuracy and reliable mounting. 4）The thickness shall be no greater than 6.35 mm, providing suitable dimensions for integration into precision optical setups. 5）The thickness tolerance shall be ±0.25 mm, ensuring consistent mechanical dimensions and stable optical alignment. 6）The clear aperture shall be greater than 85%, providing a sufficiently large usable optical area for efficient laser beam reflection.

7）The surface quality shall be 20/10 scratch-dig or better, minimizing scattering caused by surface defects and maintaining optical beam quality. 8）The surface flatness shall be better than λ/6, minimizing wavefront distortion and maintaining stable laser beam propagation. 9）The parallelism error shall be less than 180 arcsec, ensuring sufficient parallelism between the optical surfaces for stable beam alignment. 10）The coating shall provide HRs >99.95% and HRp >99.85% at 532 nm, ensuring high reflection efficiency and minimizing optical power loss for both polarization components. 11）Shall be designed for an angle of incidence (AOI) of 45°, enabling efficient steering and routing of the 532 nm laser beam within the experimental optical system. B. Specification 1. 369–399 nm, 45° Low Loss Mirror 1）Material: UV Fused Silica 2）Face dimensions: Ø25.4 mm 3）Face dimensions tolerance: ≤ +0/-0.15 mm 4）Thickness: ≤ 6.35 mm 5）Thickness tolerance: ±0.25 mm 6）Clear aperture: >85% 7）Surface quality: 20/10 s-d 8）Surface flatness: < λ/6 9）Parallelism error: <180 arcsec 10）Reflectivity & Coating: HRs>99.95% + HRp>99.85% @369–399 nm 11）AOI: 45° 2. 740–760 nm, 45° Low Loss Mirror 1）Material: UV Fused Silica 2）Face dimensions: Ø25.4 mm 3）Face dimensions tolerance: ≤ +0/-0.15 mm 4）Thickness: ≤ 6.35 mm 5）Thickness tolerance: ±0.25 mm

6）Clear aperture: >85% 7）Surface quality: 20/10 s-d 8）Surface flatness: < λ/6 9）Parallelism error: <180 arcsec 10）Reflectivity & Coating: HRs>99.95% + HRp>99.85% @740–760 nm 11）AOI: 45° 3. 935 nm, 45° Low Loss Mirror 1）Material: UV Fused Silica 2）Face dimensions: Ø25.4 mm 3）Face dimensions tolerance: ≤ +0/-0.15 mm 4）Thickness: ≤ 6.35 mm 5）Thickness tolerance: ±0.25 mm 6）Clear aperture: >85% 7）Surface quality: 20/10 s-d 8）Surface flatness: < λ/6 9）Parallelism error: <180 arcsec 10）Reflectivity & Coating: HRs>99.95% + HRp>99.85% @935 nm 11）AOI: 45° 4. 369–399 nm, 0° Low Loss Mirror 1）Material: UV Fused Silica 2）Face dimensions: Ø25.4 mm 3）Face dimensions tolerance: ≤ +0/-0.15 mm 4）Thickness: ≤ 6.35 mm 5）Thickness tolerance: ±0.25 mm 6）Clear aperture: >85% 7）Surface quality: 20/10 s-d 8）Surface flatness: < λ/6 9）Parallelism error: <180 arcsec 10）Reflectivity & Coating: HRs>99.95% @369–399 nm 11）AOI: 0° 5. 355 nm, 45° Low Loss Mirror 1）Material: UV Fused Silica 2）Face dimensions: Ø25.4 mm 3）Face dimensions tolerance: ≤ +0/-0.15 mm 4）Thickness: ≤ 6.35 mm 5）Thickness tolerance: ±0.25 mm 6）Clear aperture: >85% 7）Surface quality: 20/10 s-d 8）Surface flatness: < λ/6 9）Parallelism error: <180 arcsec 10）Reflectivity & Coating: HRs>99.95% + HRp>99.85% @355 nm 11）AOI: 45°

6. 532 nm, 45° Low Loss Mirror 1）Material: UV Fused Silica 2）Face dimensions: Ø25.4 mm 3）Face dimensions tolerance: ≤ +0/-0.15 mm 4）Thickness: ≤ 6.35 mm 5）Thickness tolerance: ±0.25 mm 6）Clear aperture: >85% 7）Surface quality: 20/10 s-d 8）Surface flatness: < λ/6 9）Parallelism error: <180 arcsec 10）Reflectivity & Coating: HRs>99.95% + HRp>99.85% @532 nm 11）AOI: 45° Ⅳ. 기타 조건(Remarks) 1. Warranty: 90 days from original shipment 2. Installation and training: Not included 3. Shipment: To be shipped before December 10, 2026 === 1. 2026-B022 외자구매 입찰공고문.hwp === 입찰공고번호 제2026–B022호

외자구매 입찰 공고

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